发明名称 |
Pattern and fabricating method therefor, device and fabricating method therefor, electro-optical apparatus, electronic apparatus, and method for fabricating active matrix substrate |
摘要 |
A method for fabricating a pattern on a substrate, includes the steps of forming banks according to formation areas of the pattern on the substrate, disposing a first function liquid between the banks, disposing a second function liquid on the first function liquid, and applying predetermined treatments to the first and the second function liquids which are disposed between the banks so as to form the pattern with plural materials stacked one on the other.
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申请公布号 |
US2007194449(A1) |
申请公布日期 |
2007.08.23 |
申请号 |
US20070785010 |
申请日期 |
2007.04.13 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
HIRAI TOSHIMITSU |
分类号 |
G02F1/1343;H01L23/52;B05D5/12;B05D7/00;G02F1/136;G02F1/1362;G09F9/00;H01L21/288;H01L21/3205;H01L21/336;H01L21/768;H01L21/77;H01L27/12;H01L27/32;H01L29/786;H01L51/00;H01L51/40;H01L51/50;H05B33/02;H05B33/10;H05K3/12 |
主分类号 |
G02F1/1343 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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