| 摘要 |
PROBLEM TO BE SOLVED: To acquire a detection image of high contrast without distortion. SOLUTION: This substrate inspection device 1 has an electron beam device 10 that includes an electron gun section 20 for generating an electron beam and radiating it to a sample S, and includes an electron detecting section 40 for detecting at least one of a secondary electron generated from the surface of the sample by the radiation of the electron beam, a reflected electron, and back scattered electron. The substrate inspection device 1 further has a surface potential homogenizing device 150 for eliminating the local potential difference in the surface layer of the sample S by generating an ion and radiating the ion to the sample S prior to the radiation of the electron beam by the electron gun 10 section. COPYRIGHT: (C)2007,JPO&INPIT
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