发明名称 MANUFACTURING METHOD OF NITRIDE SEMICONDUCTOR LASER ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a nitride semiconductor laser element where the resonance plane thereof being nearly equal to a mirror plane is obtained by means of cleavage, and a method for producing the resonance plane of the laser element. SOLUTION: In the nitride semiconductor laser element, nitride semiconductor layers including an active layer are grown on a substrate, subsequently, a groove is formed in the surface of the top layer of the nitride semiconductor layers, the top nitride semiconductor is cleaved from the groove, the cleavage plane of the cleaved semiconductor layer is a plane corresponding to anyone of (1T00) face, (10T0) face, (01T0) face, (T100) face, (T010) face, and (0T10) face, and at least one of the resonance planes of the laser element is caused to be the cleavage plane. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007214604(A) 申请公布日期 2007.08.23
申请号 JP20070140655 申请日期 2007.05.28
申请人 NICHIA CHEM IND LTD 发明人 SUGIMOTO YASUNOBU;NAKAMURA SHUJI
分类号 H01S5/00;H01S5/343 主分类号 H01S5/00
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