发明名称 |
MIKROSTRUKTURIERUNGSVERFAHREN |
摘要 |
Ion beam lithography technique wherein a higher amount of radiation energy is deposited to predetermined regions in the bulk if a suitable substrate. By selecting the radiation nature, its energy and the irradiation parameters a structure can be created in the bulk of the material leaving the surface essentially untouched. |
申请公布号 |
DE602004007500(D1) |
申请公布日期 |
2007.08.23 |
申请号 |
DE20046007500T |
申请日期 |
2004.04.26 |
申请人 |
HAUTE ECOLE ARC NE-BE-JU |
发明人 |
JACCARD, SAMUEL;MIKHAILOV, SERGUEI;MUNNIK, FRANS |
分类号 |
G03F7/20;H01J37/317 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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