RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY AND METHOD FOR FORMATION OF RESIST PATTERN

摘要

Disclosed is a resist composition for immersion lithography comprising: a resin component (A) whose alkali solubility can vary by the action of an acid; and an acid-generator component (B) which can generate an acid when exposed to light. The resin component (A) contains a fluorine atom and comprises a resin (A1) and a resin (A2), wherein the resin (A1) has no acid-dissociating group and the resin (A2) has a constituent unit (a') derived from acrylic acid and contains no fluorine atom.