| 摘要 |
PROBLEM TO BE SOLVED: To provide a mold which makes the transfer of a pattern in a high aspect ratio possible and prevents the destruction of the resin pattern in an imprint method and a method for manufacturing the mold. SOLUTION: The mold for an imprint in which the uneven pattern is formed, and at least the corners of the projections of the pattern are rounded is provided. The material of the uneven pattern forming part of the mold is silicon, quartz, glass, diamond, a silicon compound, a metal, a metallic compound, or a ceramic substance. The rounding of the corners of the projections can be carried out by dry etching, wet etching, or annealing. COPYRIGHT: (C)2007,JPO&INPIT
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