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发明名称
Procédé de fabrication de contacts à revêtement électrolytique pour dispositif semiconducteur
摘要
申请公布号
FR1547557(A)
申请公布日期
1968.11.29
申请号
FR19670120157
申请日期
1967.09.06
申请人
ITT INDUSTRIES INC.
发明人
DEVITT DOUGLAS JOHN
分类号
H01L21/288;H01L23/485
主分类号
H01L21/288
代理机构
代理人
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