| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an exposure method for obtaining high resolution by a proximity exposure method and to achieve significant reduction of the initial cost so as to solve such problems that a projection aligner is disadvantageous because of a high initial cost although the projection aligner is excellent in exposure position accuracy and resolution and that a proximity exposure method is disadvantageous particularly because of low resolution although the initial cost is low. <P>SOLUTION: A corner having an angle of 0 to 180°in an opening or a light shielding mask pattern is rounded, or an auxiliary pattern in an oblique slit form is associated with the outside or inside of the opening or the light-shielding mask pattern. Otherwise, both of the methods are employed, and thereby rounding in a corner of a pattern occurring in proximity exposure can be prevented and a desired pattern can be obtained. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
