发明名称 MULTILAYER STRUCTURE AND ITS MANUFACTURING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a multilayer structure and its manufacturing method capable of stably manufacturing at simple process. <P>SOLUTION: On a substrate 1, the multilayer structure comprises a surface layer 3 wherein at least one atom layer of alkaline metal atom is laminated via a buried layer 2 wherein at least one atom layer of alkaline metal atom on the substrate is substituted, and its work functionϕis set at 3 eV or less. As an alkaline metal atom, Rb can be used, and as the metal substrate 1, Cu, Ni or those alloys can be applied. After forming an adhesive layer where the compound particles of alkaline metal atom is finely dispersed on the metal substrate 1, the multilayer structure can be manufactured by irradiating high energy beam at this adhesion layer. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007214196(A) 申请公布日期 2007.08.23
申请号 JP20060029896 申请日期 2006.02.07
申请人 TOHOKU UNIV;NAGOYA INSTITUTE OF TECHNOLOGY 发明人 TANAKA SHUNICHIRO;MAKINO TAKEHIKO;TAKIOTO ATSUSHI;AKAHORI MITSURU
分类号 H01L37/00 主分类号 H01L37/00
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