Lithographic apparatus and device manufacturing method
摘要
A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.
申请公布号
EP1821150(A1)
申请公布日期
2007.08.22
申请号
EP20070007495
申请日期
2005.12.01
申请人
ASML NETHERLANDS B.V.
发明人
HENNUS, PIETER RENAAT MARIA;MERTENS, JEROEN JOHANNES SOPHIA MARIA;SMULDERS, PATRICK JOHANNES CORNELUS HENDRICK;SMITS, PETER
