发明名称 Integrated circuit with increased heat transfer
摘要 A technique for improving the thermal power dissipation of an integrated circuit includes reducing the thermal resistivity of the integrated circuit by increasing heat transfer in vertical and/or lateral directions. These results are achieved by increasing the surface area of the backside and/or the surface area of the lateral sides of the integrated circuit die. In some embodiments of the invention, an integrated circuit includes circuit elements formed closer to a first surface of a semiconductor substrate than to a second surface of the semiconductor substrate. The semiconductor substrate has a varying profile that substantially increases the surface area of a thermal interface formed on the second surface as compared to the second surface being substantially planar. A maximum depth of the profile is less than the thickness of the semiconductor substrate.
申请公布号 US7259458(B2) 申请公布日期 2007.08.21
申请号 US20050050572 申请日期 2005.02.03
申请人 ADVANCED MICRO DEVICES, INC. 发明人 SU MICHAEL ZHUOYING;EPPES DAVID HARRY
分类号 H01L23/34 主分类号 H01L23/34
代理机构 代理人
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