APPARATUS FOR CLEANING SEMICONDUCTOR SUBSTRATES

摘要

An apparatus for cleaning a semiconductor substrate is provided to supply uniformly a cleaning solution onto the entire surface of the substrate by spraying the solution toward the substrate from an upper center portion of the substrate. A cleaning apparatus includes a bath(310) for cleaning a substrate, and a spraying part(330) positioned over the substrate which is located in the bath during the cleaning process, to spray a cleaning solution onto the substrate. The spray part is moved out of the bath by a transfer unit(340), so that a support member holding plural substrates comes in or goes out of the bath. The spray part has supply tubes(332) supplying the cleaning solution, spray tubes(334), and spray nozzles each installed on the spray tubes.