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发明名称
具有双功函数金属闸堆叠的CMOS半导体元件CMOS SEMICONDUCTOR DEVICES HAVING DUAL WORK FUNCTION METAL GATE STACKS
摘要
本发明提供了一种藉由采用制造技术而形成的、具有双功函数金属闸结构的CMOS半导体元件,此CMOS半导体元件为PMOS元件和NMOS元件提供了单独的功函数控制,并有效地减少或者消除了对闸介电质可靠性的影响。
申请公布号
TW200731540
申请公布日期
2007.08.16
申请号
TW096103481
申请日期
2007.01.31
申请人
三星电子股份有限公司
发明人
丁炯硕;李锺镐;韩成基;金柱然;朴廷
分类号
H01L29/78(2006.01)
主分类号
H01L29/78(2006.01)
代理机构
代理人
詹铭文;萧锡清
主权项
地址
韩国
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