| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a layer having a locally-adapted or predetermined layer thickness characteristics. <P>SOLUTION: (a) At least one layer (7) is formed on a substrate. (b) A removing shape for the formed layer is determined. (c) Irradiation of the upside of the layer, with at least one ion beam (9), is performed at least once so that the layer (7) is locally etched at the place of the ion beam according to the removal characteristics. As a result, the layer having the locally-adapted or predetermined layer thickness characteristic can be formed. <P>COPYRIGHT: (C)2007,JPO&INPIT |
