发明名称 |
Projection Lens for a Microlithographic Projection Exposure Apparatus |
摘要 |
A projection lens for a EUV microlithographic projection exposure apparatus comprises a diaphragm (BL) which is arranged at a distance (D) in front of a mirror (S 2 ) of the lens. The diaphragm (BL) has a non-round aperture with an edge contour that may be configured such two rays of a light bundle disposed symmetrically with respect to a chief ray are treated equally, i.e. either both rays pass through the diaphragm aperture or both are blocked by the diaphragm.
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申请公布号 |
US2007188729(A1) |
申请公布日期 |
2007.08.16 |
申请号 |
US20070738935 |
申请日期 |
2007.04.23 |
申请人 |
CARL-ZEISS SMT AG |
发明人 |
MANN HANS-JURGEN;SINGER WOLFGANG |
分类号 |
G03B27/54;G02B5/00;G02B17/06;G03F7/20 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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