发明名称 NON-DESTRUCTIVE ANALYZING METHOD OF INSPECTION TARGET DUE TO X RAYS AND MEASURING INSTRUMENT THEREFOR
摘要 PROBLEM TO BE SOLVED: To analyze an inspection target related to an element or molecule distribution by X rays. SOLUTION: X rays (1) having a determined energy spectrum are produced by an X-ray source, the standing wave field (4) of these X rays (1) is formed by at least one X-ray optical lattice (2) in the beam path of X rays (1), this X-ray standing wave field (4) is at least partially positioned within the inspection target (5), the radiation (6) excited by the X-ray standing wave field (4) in the inspection target (5) is measured in dependence on at least one relative position between the inspection target (5) and the X-ray standing wave field (4) and the substance distribution (5. x) in the inspection target (5) is estimated from the measuring result of the radiation (6) excited by the X-ray standing wave field (4). COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007206076(A) 申请公布日期 2007.08.16
申请号 JP20070020099 申请日期 2007.01.30
申请人 SIEMENS AG 发明人 BAUMANN JOACHIM;ENGELHARDT MARTIN;FREUDENBERGER JOERG;ECKHARD HEMPEL;HOHEISEL MARTIN;MERTELMEIER THOMAS DR;POPESCU STEFAN;SCHUSTER MANFRED
分类号 G01N23/223 主分类号 G01N23/223
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