| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition for use in the production process of a semiconductor, such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, which excels in exposure latitude and is improved in line edge roughness and pattern profile. <P>SOLUTION: The photosensitive composition contains (A) a compound, capable of generating an acid of a specific structure, represented by Formula (I) or Formula (I') upon irradiation with an actinic ray or radiation and (B) a basic compound having a specific benzimidazole skeleton. A pattern forming method using the same is also provided. <P>COPYRIGHT: (C)2007,JPO&INPIT |
