| 发明名称 |
LITHOGRAPHY APPARATUS, METHOD OF MANUFACTURING DEVICE, AND EXCHANGEABLE OPTICAL ELEMENT |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography apparatus having improved focusing ability, a method of manufacturing a device, and an exchangeable optical element. <P>SOLUTION: A projection system PS has one or several faces PP which correspond to Fourier conjugate of an object surface at which a patterning device MA is disposed, or an image surface at which a substrate W is disposed. Such a surface is known as pupil surface. While a projection image can be usefully improved by disposing an optical element 10 in the pupil surface, the system further has an assembly in which the optical element 10 can be exchanged in the pupil surface. <P>COPYRIGHT: (C)2007,JPO&INPIT |
| 申请公布号 |
JP2007208257(A) |
申请公布日期 |
2007.08.16 |
| 申请号 |
JP20070012368 |
申请日期 |
2007.01.23 |
| 申请人 |
ASML NETHERLANDS BV;CARL ZEISS SMT AG |
发明人 |
LOOPSTRA ERIK R;ENGELEN ADRIANUS FRANCISCUS PETRUS;LUTTIKHUIS BERNARDUS ANTONIUS JOHANNES;RUBINGH MARIA JOHANNA AGNES;HAZENBERG JOHANNES MARTINUS ANDREAS;JORRITSMA LAURENTIUS CATRINUS;DE KLERK JOHANNES W;GEUPPERT BERNHARD;SCHAPP PETER;VAN BEUZEKOM AART ADRIANUS;PETRUS FRANCISCUS WILHELMUS MARIA MANDIGERS;SORG FRANZ;DEUFEL PETER |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
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