发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which can satisfy both alkali developability and photocurability and which will not cause warpage of a substrate at curing, because of small shrinkage due to curing. <P>SOLUTION: The photosensitive resin composition capable of forming an alkali developable film contains an acid modified vinyl ester, having a bisphenol S skeleton and an alkylene glycol chain. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007206421(A) 申请公布日期 2007.08.16
申请号 JP20060025743 申请日期 2006.02.02
申请人 NIPPON SHOKUBAI CO LTD 发明人 OTSUKI NOBUAKI
分类号 G03F7/032;C08F290/00;C08G59/17;G03F7/027;G03F7/038 主分类号 G03F7/032
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