发明名称 Positively radiation-sensitive resin composition
摘要 It is an object of the present invention to provide a production process capable of precisely producing a plated shaped article of a large thickness such as a bump or a wiring, a positive radiation-sensitive resin composition which is preferably used for the process and has excellent sensitivity and resolution, and a transfer film using the composition. The above object is achieved by a positive radiation-sensitive resin composition comprising (A) a polymer containing structural units represented by the following formula (1) and/or the following formula (2) and an acid-dissociable functional group (b), (B) a component which generates an acid by irradiation with radiation and (C) and organic solvent, and is achieved by producing a positive radiation-sensitive resin film using the composition.
申请公布号 US2007190465(A1) 申请公布日期 2007.08.16
申请号 US20050593812 申请日期 2005.03.24
申请人 JSR CORPORATION 发明人 NISHIKAWA KOUJI;IWANAGA SHIN-ICHIRO
分类号 H01L21/00;C08F220/18;C08F220/30;C08F220/58;C08L33/06;C08L33/26;C25D5/02;G03C5/00;G03F7/033;G03F7/039;G03F7/20;G03F7/40;H01L21/027;H01L21/60 主分类号 H01L21/00
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