| 摘要 |
<P>PROBLEM TO BE SOLVED: To lessen an amount of debris coming into an illuminating system and prolong the life of a collector in a radiation system. <P>SOLUTION: The radiation system of the lithography device is provided with at least either of a pollutant trap that traps substances discharged from a radiation source and a collector that condenses radiated beams. At least either of the pollutant trap and the collector is provided with elements disposed in the path of radiation beams, the substances discharged from the radiation source can be attached to the elements while the radiation beams propagate in the radiation system. At least a part of the elements disposed in the path of the radiation beams has a surface of big mirror grazing incidence reflectance for lessening the absorption of the radiation beams that propagate substantially in non-parallel directions to the surfaces of the elements and reducing thermal load which the elements encounter. <P>COPYRIGHT: (C)2007,JPO&INPIT |
