| 摘要 |
PROBLEM TO BE SOLVED: To provide a wafer holder having a reference alignment mark which is observed from both surfaces, is not deformed even in thermal processing, and is repetitively used. SOLUTION: The reference alignment mark of the wafer holder 210 is attached to a mark 141, where a transmission shape pattern 171 or a metallic pattern 161 is formed in a mark base material 151. Ceramic is used for a mark pattern in a mark base material 155, and a penetration mark pattern 165 is formed when the mark base material 155 is molded, or a silicon wafer is used in a mark base material 153 and a mark pattern 163 is formed with metal on a front surface, or a silicon membrane is used in a mark base material 157 and a penetration pattern 167 is formed by etching. COPYRIGHT: (C)2007,JPO&INPIT |
