| 摘要 |
PROBLEM TO BE SOLVED: To provide a confocal imaging apparatus for imaging the end edge of a semiconductor wafer all over the periphery as a confocal image. SOLUTION: A wafer stage (2) that supports the semiconductor wafer (1) has a rotating table (3), and the semiconductor wafer is supported on the rotating table. Linear light beams are projected from the objective lens system (22) of an imaging optical system (6) toward the rotating semiconductor wafer. The end edge of the semiconductor wafer is scanned all over the periphery with convergent linear light beams, and the linear reflection light reflected by the end edge of the semiconductor wafer is received by a linear image sensor (23) through the objective lens system. Since each light receiving element of the linear image sensor individually includes a light incident surface, a confocal optical system is constituted. Consequently, the end edge of the semiconductor wafer is imaged all over the periphery as the confocal image. COPYRIGHT: (C)2007,JPO&INPIT
|
