| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and a device for manufacturing a glass substrate with a pattern, capable of removing a development residue of an unwanted resist without impairing a shape of a resist pattern. SOLUTION: This method comprises the steps of forming the resist pattern on a surface of the glass substrate, charging a surface of the resist pattern to an electrically positive polarity, and irradiating gas cluster ion beams onto the glass substrate and the surface of the resist pattern to remove the development residue of the resist pattern. COPYRIGHT: (C)2007,JPO&INPIT
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