| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for preparing a nano-level systematic structure having determined uniform dimensions and dispositions in a substrate-scale on a substrate. SOLUTION: The method for preparing a nano-structure including a step that provides the substrate 100 having an embedded barrier layer 2 and a crystalline film 5 provided with a network of crystal defect and/or stress field 12 in a crystalline zone 13 on the barrier layer 2, and one or some steps that erode the substrate 100 that is a preferred erosion of the crystalline zone 13 between the crystal defect and/or stress field or between the crystal defects and/or between the stress fields, i.e., a erosion step that forms protrusions 7 bringing about the nano-structure 7, 8 by locally exposing the barrier layer 2 and bottoms are mutually separated by recesses 7.1 positioned inside the barrier layer. COPYRIGHT: (C)2007,JPO&INPIT |
