| 摘要 |
PROBLEM TO BE SOLVED: To provide a measurement method and a system for reducing affects due to the difference in sensitivity between a reference unit and a measuring unit for improving the measurement accuracy of variation in attenuated total reflection state, when using measurement results in the reference unit to compensate measured results in the measuring unit. SOLUTION: In this method, first only a solvent is supplied to a measuring chip 6 and a reference chip 6' with sensing matter 30 fixed; light beam 13 is made to enter at various angles so as to obtain total reflection conditions in the interface between metal film 12, formed on inner base of each chip and dielectric block 10 under the metal film, and the light beam 13 totally-reflected in the interface is detected through photodiode array 17 to compute the difference in the sensitivities between the measuring unit 5 and the reference unit 5', based on the above detected result. After that, the test object is added only to the measuring chip 6 to similarly make measurement, and then the difference in sensitivity is used to calibrate measurement result of the reference unit 5', compensating measurement result of the measuring unit 5, based on the calibrated measurement result. COPYRIGHT: (C)2007,JPO&INPIT
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