| 摘要 |
New monomers, norbornenylmethyl fluoroalkyl ethers, made by reaction of bicyclo(2,2,1)hept-5-ene-2-methanol with fluoro(alkyl vinyl ethers), are described. These monomers are useful in making polymers such as hydrophobic, hydrolytically-resistant polymers for photoresists, particularly for use in photoimaging by immersion lithography with 193 nm light.
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