发明名称 |
PLASMA PROCESSING APPARATUS HAVING HIGH FREQUENCY POWER SOURCE WITH SAG COMPENSATION FUNCTION AND PLASMA PROCESSING METHOD |
摘要 |
The plasma processing apparatus wherein the means for applying a high frequency voltage, which becomes a voltage waveform in which a positive constant voltage and a negative constant voltage alternate with each other at given cycles, is constituted by a DC power source and a switching circuit (a chopper circuit).
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申请公布号 |
US2007186856(A1) |
申请公布日期 |
2007.08.16 |
申请号 |
US20070735574 |
申请日期 |
2007.04.16 |
申请人 |
YASUI NAOKI;WATANABE SEIICHI;SUMIYA MASAHIRO;TAMURA HITOSHI |
发明人 |
YASUI NAOKI;WATANABE SEIICHI;SUMIYA MASAHIRO;TAMURA HITOSHI |
分类号 |
C23C16/00;C23F1/00;H01J37/32 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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