| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an alkali developable resin composition and an alkali developable photosensitive resin composition having excellent sensitivity, resolution and developability and capable of accurately forming a fine pattern. <P>SOLUTION: The alkali developable resin composition uses a photopolymerizable unsaturated compound having a structure formed by adding an epoxy compound (D) and further esterifying a polybasic acid anhydride (E), to a reaction product prepared by esterifying a polybasic acid anhydride (C) to an epoxy additive having a structure formed by adding an unsaturated monobasic acid (B) to an epoxy compound (A) represented by formula (I). <P>COPYRIGHT: (C)2007,JPO&INPIT |
