| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning method where reaction by-products composed of titanium chloride can be efficiently removed without using plasma. SOLUTION: Regarding the cleaning method where a titanium chloride M stuck to the inside of a treatment vessel 4 for performing film deposition to a substrate W is removed, in a state of heating the inside of the treatment vessel to≥130°C, the titanium chloride is removed using a ClF based gas as a cleaning gas. In this way, the titanium chloride is swiftly and efficiently removed. COPYRIGHT: (C)2007,JPO&INPIT
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