发明名称 Leveling algorithm for semiconductor manufacturing equipment and related apparatus
摘要 A method of reading surface levels of a field defined on a substrate using a sensing apparatus having at least one cell array composed of a plurality of cells, in which some of the cells constituting the at least one cell array are selected and designated as available cells. Light is radiated onto a surface of the field. Light reflected to the available cells from the surface is sensed to extract available level signals. The available level signals may be calculated to read the surface level of the field. The surface level of the field are used in a method of controlling the level of an exposure apparatus controlling the substrate mounted on a leveling stage in up, down, right, left, front, back, and rotational directions using the surface level.
申请公布号 US2007188756(A1) 申请公布日期 2007.08.16
申请号 US20060483497 申请日期 2006.07.10
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LIM JONG-HO
分类号 G01B11/00;G01B11/02;H01L21/66 主分类号 G01B11/00
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