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发明名称
Verfahren zum Betreiben einer Sputterkathode mit einem Target
摘要
申请公布号
DE502005000983(D1)
申请公布日期
2007.08.16
申请号
DE200550000983T
申请日期
2005.05.13
申请人
APPLIED MATERIALS GMBH & CO. KG
发明人
BANGERT,STEFAN;HANIKA, MARKUS;KOENIG, MICHAEL
分类号
C23C14/35
主分类号
C23C14/35
代理机构
代理人
主权项
地址
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