| 摘要 |
PROBLEM TO BE SOLVED: To adjust the image formation position of laser beams speedily to undulations at a substrate side in a crystallization device. SOLUTION: The crystallization device 1 comprises an optical system 2 including an illumination optical system 2b for applying laser beams, an optical modulation element 2c for modulating laser beams into rays having prescribed light intensity distribution, and an image-forming optical system 2d for forming the modulation light of the optical modulation element on a substrate; and a substrate stage 3 for supporting a substrate, thus melting a thin film provided on the substrate by modulation light for crystallization. The crystallization device has an image-forming optical system actuator 8 for adjusting a position in the Z-axis direction of the image-forming optical system 2d. The image-forming optical system actuator 8 adjusts the image formation position of the modulation light formed by the image-forming optical system 2d, by adjusting the position in the Z-axis direction of the image-forming optical system 2d. COPYRIGHT: (C)2007,JPO&INPIT
|
