发明名称 Diffusion barrier for assemblies with metallic and silicon containing components and method therefor
摘要 <p>A method for inhibiting diffusion of silicon into a support structure (14) from a component (12) formed of a silicon-containing material, and an assembly (10) formed thereby. The component (12) is supported and contacted by the support structure (14) so as to define a contact interface therebetween. An barrier coating (18) is present on the component (12) and/or the support structure (14), so as to be disposed at the contact interface to prevent direct physical contact between the silicon-containing material and the superalloy substrate. </p>
申请公布号 EP1693478(A3) 申请公布日期 2007.08.15
申请号 EP20060250820 申请日期 2006.02.16
申请人 GENERAL ELECTRIC COMPANY 发明人 LUTHRA, KRISHAN LAL;MCKEE, DOUGLAS WILLIAM
分类号 C23C4/08;C23C28/00 主分类号 C23C4/08
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