发明名称 |
Diffusion barrier for assemblies with metallic and silicon containing components and method therefor |
摘要 |
<p>A method for inhibiting diffusion of silicon into a support structure (14) from a component (12) formed of a silicon-containing material, and an assembly (10) formed thereby. The component (12) is supported and contacted by the support structure (14) so as to define a contact interface therebetween. An barrier coating (18) is present on the component (12) and/or the support structure (14), so as to be disposed at the contact interface to prevent direct physical contact between the silicon-containing material and the superalloy substrate.
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申请公布号 |
EP1693478(A3) |
申请公布日期 |
2007.08.15 |
申请号 |
EP20060250820 |
申请日期 |
2006.02.16 |
申请人 |
GENERAL ELECTRIC COMPANY |
发明人 |
LUTHRA, KRISHAN LAL;MCKEE, DOUGLAS WILLIAM |
分类号 |
C23C4/08;C23C28/00 |
主分类号 |
C23C4/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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