| 发明名称 |
System and method for monitoring semiconductor production apparatus |
| 摘要 |
A plurality of pieces of process data are acquired from a semiconductor production apparatus while it is in operation, and then, a multivariate analysis model is created using at least a portion of the plurality of pieces of process data.
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| 申请公布号 |
US7257457(B2) |
申请公布日期 |
2007.08.14 |
| 申请号 |
US20030619191 |
申请日期 |
2003.07.15 |
| 申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
IMAI SHINICHI;TAGUCHI MASAKI |
| 分类号 |
H01L21/3065;G05B23/02;H01L21/00;H01L21/02;H01L21/66 |
主分类号 |
H01L21/3065 |
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