发明名称 |
MAGNETORESISTANCE DEVICE COMPRISING DIFFUSION BARRIER LAYER |
摘要 |
A magnetoresistance device including a diffusion barrier layer is provided to prevent the diffusion of a main component when a magnetoresistance device is heated in a high temperature process or heated to a high temperature by interposing a diffusion barrier layer between an underlying layer and an anti-ferromagnetic layer. A magnetoresistance device includes a substrate, an underlying layer(21) is formed on the substrate, and a magnetoresistance structure formed on the underlying layer. A diffusion barrier layer(22) is interposed between the underlying layer and the magnetoresistance structure. The magnetoresistance structure can include an anti-ferromagnetic layer, a first ferromagnetic layer, a non-magnetic spacer layer formed on the first ferromagnetic layer, and a second ferromagnetic layer formed on the spacer layer. The magnetization direction of the first ferromagnetic layer is fixed by the anti-ferromagnetic layer. The magnetization direction of the second ferromagnetic layer can be changed.
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申请公布号 |
KR20070080983(A) |
申请公布日期 |
2007.08.14 |
申请号 |
KR20060012599 |
申请日期 |
2006.02.09 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
YOON, SEONG YONG;LEE, JAE CHEOL;KIM, YONG SU;OH, HOON SANG |
分类号 |
H01L27/02 |
主分类号 |
H01L27/02 |
代理机构 |
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地址 |
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