APPARATUS FOR SUBSTRATE TRANSACTION

摘要

An apparatus for processing a substrate is provided to maximize dry efficiency by injecting dry gas to the upper part and both lateral surfaces of an inner bath. Substrates are received in a process bath(112). A cleaning solution supply part supplies a cleaning solution, positioned in the lower part of the process bath. A gas supply part injects dry gas to the process bath to remove the moisture remaining on the substrate, including a first gas injection part installed in the upper part of the process chamber and a second gas injection part installed in the lateral part of the process chamber. The first gas injection part can include upper nozzles disposed in parallel with the direction crossing the substrates. The upper nozzles include injection holes for vertically injecting the dry gas downward.