发明名称 |
Positive resist composition |
摘要 |
A positive resist composition comprising the components of: (A) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation; (B) a resin that is insoluble or slightly soluble in alkalis, but becomes alkali-soluble under an action of an acid; (C) a basic compound; and (D) a compound comprising at least three hydroxyl groups or at least three substituted hydroxyl groups, and comprising at least one cyclic structure.
|
申请公布号 |
US7255971(B2) |
申请公布日期 |
2007.08.14 |
申请号 |
US20020244070 |
申请日期 |
2002.09.16 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
FUJIMORI TORU;KAWABE YASUMASA |
分类号 |
G03C1/73;C08F212/14;C08F220/10;C08F232/00;G03F7/004;G03F7/039;H01L21/027 |
主分类号 |
G03C1/73 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|