| 摘要 |
Provided are an antistatic agent to prevent fogging or film from being decreased in chemically amplified resist, an antistatic film obtained by using the antistatic agent, a product coated with the antistatic film, and a method for forming a pattern by using the antistatic film. The antistatic agent comprises 0.1-20 wt% of a water-soluble conductive polymer; 70.0-99.8 wt% of a solvent; and 0.0001-10 wt% of a water-soluble polymer. Preferably the water-soluble polymer has a polypeptide structure. Preferably the water-soluble polymer is represented by P^1-Z-P^2, wherein P^1 is represented by -N(-R')-, P^2 is -C(=O)- and Z is -CH(-R)-; P^1 is -(C(-)H-CH2)-, P^2 is an alkyl group, and Z is -O-; or P^1 is -(C(-)H-CH2)-, P^2 forms a lactam group together with Q, and Z is or -N(-Q)-. |
