SEMICONDUCTOR LASER DEVICE AND METHOD FOR MANUFACTURING THE SAME HAVING STRUCTURE OF NON-ABSORBING MIRROR
摘要
A semiconductor laser device having a non-absorbing mirror structure and a fabrication method thereof are provided to reduce a fabrication cost by removing an edge pattern forming process and a re-growth process for forming a non-absorbing mirror structure by using a seed pattern structure with different see width according to a region. A fabrication method of a semiconductor laser device having a non-absorbing mirror structure includes the steps of: preparing a substrate(10); forming wing in a vertical direction to cavity or seed patterns(20) having different widths; forming a base layer(30) having a vertical growth step difference on the substrate(10) where the seed patterns(20) are formed; forming a lamination of a semiconductor layer(40) on the base layer(30); and completing a fabrication of the semiconductor laser device by forming a ridge-type contact layer(50) on the lamination of the semiconductor layer(40).
申请公布号
KR20070080695(A)
申请公布日期
2007.08.13
申请号
KR20060012055
申请日期
2006.02.08
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
KIM, KYU SANG;SHIM, JONG IN;HA, KYOUNG HO;CHAE, JUNG HYE