RF PLAZA IMPEDANCE DETECTOR IN SEMICONDUCTOR/LCD MANUFACTURING EQUIPMENT

摘要

An RF plasma impedance detector of semiconductor/display manufacturing equipment is provided to block an inflow path of noise due to complicated circuit configuration by detecting phase and amplitude of RF power. A phase detection unit(11) demodulates reflective power of RF power supplied from an RF power generator and selects a specific frequency region to detect phase. A detecting unit(13) extracts the reflective power reflected from the RF power and a chamber. An amplitude detection unit(15) demodulates the reflective power of RF power supplied from the RF power generator through an RC circuit and selects a specific level region to detect the amplitude. A phase error detecting unit(17) filters phase signals detected in the phase detection unit to output a reference phase signal. An amplitude error detecting unit(19) filters an amplitude signal detected in the amplitude detection unit to output a reference amplitude signal.