发明名称 |
WAFER ATAGE OF SEMICONDUCTOR MANUFACTURE APPARATUS |
摘要 |
<p>A substrate stage of a semiconductor manufacturing apparatus is provided to prevent the generation of process failure of substrate by detecting an obliquely loaded state of the substrate on a table using a detection unit with at least two sensors capable of detecting an edge portion of the substrate. A substrate stage of a semiconductor manufacturing apparatus includes a table(130) with a support surface for loading a substrate(W) and a detection unit for detecting a loading state of the substrate on the support surface of the table. The detection unit includes at least two sensors. The sensors(142a to 142d) are installed on the support surface of the table in order to detect an edge portion of the substrate.</p> |
申请公布号 |
KR20070080528(A) |
申请公布日期 |
2007.08.10 |
申请号 |
KR20060011894 |
申请日期 |
2006.02.07 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, SUN BONG |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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