发明名称 CHEMICAL CIRCULATION APPARATUS
摘要 A chemical circulation apparatus is provided to prevent the generation of processing accidents due to an abnormal state of a circulation pump by detecting the flow rate of the circulating pump and stopping a corresponding process. A chemical circulation apparatus includes an inner bath(102) for storing chemicals, an outer bath, a circulation pump and a flow meter. The outer bath(104) receives the chemicals overflown the inner bath. The circulation pump(108) supplies the chemicals overflown the outer bath to the inner bath. The flow meter is installed at an output port of the circulation pump in order to monitor the flow rate of the circulation pump. The flow meter is capable of generating an interlock corresponding to the variation of the flow rate of the circulation pump.
申请公布号 KR20070080522(A) 申请公布日期 2007.08.10
申请号 KR20060011887 申请日期 2006.02.07
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHOI, WOOK JIN
分类号 H01L21/02 主分类号 H01L21/02
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