| 摘要 |
<p>A process solution supply apparatus and semiconductor manufacturing equipment with the same are provided to prevent the generation of process failure due to the process solution and constant temperature water leaked from a process solution supply line and a constant temperature water supply unit. A process solution supply apparatus includes a process solution supply member(130) with a nozzle capable of supplying a process solution to a semiconductor substrate, a constant temperature water supply member, and a support unit. The constant temperature water supply member includes a supply line(142) for supplying a constant temperature water from a constant temperature water supply source to the process solution supply member and a collection line(144) for collecting the constant temperature water after controlling the temperature of the process solution. The support unit(150) is installed at a connection portion between the supply line, the collection line and the nozzle. The support unit includes a predetermined space capable of storing leaked process solution and constant temperature water.</p> |
