| 摘要 |
<p>A substrate aligning apparatus and a substrate aligning method are provided to restrain the generation of an alignment failure in a substrate aligning process by using an illumination source and a camera. A substrate aligning apparatus includes an alignment light source, a diffractive light sensor, an illumination source and a camera. The alignment light source(10) irradiates an alignment light to an alignment mark. The diffractive light sensor(15) is used for detecting a diffractive light generated from the alignment light due to the alignment mark. The illumination source(20) is used for illuminating the alignment mark. The camera(25) is used for photographing the illuminated alignment mark.</p> |
