发明名称 Double-side polishing carrier and fabrication method thereof
摘要 The carrier ( 10 ) for double-side polishing has a base material 10 a the material of which is stainless steel (SUS) , for example, as is before, and the base material 10 a is coated with a coating layer 10 b of a material having a hardness higher than that of the base material 10 a. The coating layer 10 b is desirably coated uniformly without variations in thickness and not warped easily, and the material for the coating layer 10 b of the double-side polishing carrier 10 is desirably any one selected from diamond-like carbon, a nitride film, a sapphire film and a titanium nitride film. For production of the double-side polishing carrier 10 , a double-side polishing carrier 10 ' having been used for polishing is prepared first. The used carrier 10 ' is coated with the coating layer 10 b. The invention can suppress the progress of abrasion of the double-side polishing carrier, and can provide satisfactory thickness accuracy, film thickness distribution accuracy, and surface roughness.
申请公布号 US2007184662(A1) 申请公布日期 2007.08.09
申请号 US20050629950 申请日期 2005.06.23
申请人 KOMATSU DENSHI KINZOKU KABUSHIKI KAISHA 发明人 YAMASHITA KENJI;OONO YUKIO;SUGIMOTO YUUJI
分类号 C03C15/00;B24B37/28;B44C1/22;H01L21/302;H01L21/306 主分类号 C03C15/00
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