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经营范围
发明名称
SPUTTERING MAGNETRON SOURCE
摘要
申请公布号
KR100748160(B1)
申请公布日期
2007.08.09
申请号
KR20050109669
申请日期
2005.11.16
申请人
发明人
分类号
H01L21/203
主分类号
H01L21/203
代理机构
代理人
主权项
地址
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