| 摘要 |
An object to be processed such as a semiconductor wafer is processed by supplying a process fluid such as an ozone gas and a water vapor into a process vessel from a supply source through a supply pipe. During the process, a temperature of the process fluid flowing through the supply pipe is detected. By previously measuring and recording a relationship between a temperature of the process fluid and a flow rate of the process fluid, for example, a flow rate of the process fluid can be determined based on the detected temperature of the process fluid.
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