发明名称 |
E-beam lithography system for synchronously irradiating a plurality of photomasks and method of fabricating photomasks using the same |
摘要 |
Disclosed is an E-beam lithography system for synchronously irradiating surfaces of a plurality of substrates. The E-beam lithography system may include a loading unit loading and unloading substrates, an alignment chamber aligning the substrates, a transfer chamber transferring the substrates from the loading unit or chambers, a lithography chamber radiating one or more electron beams onto the substrates, and a vacuum chamber creating a vacuum in the chambers. A stage may be installed in the lithography chamber such that the substrates may be mounted on the stage and radiated with one or more electron beams.
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申请公布号 |
US2007181828(A1) |
申请公布日期 |
2007.08.09 |
申请号 |
US20070656467 |
申请日期 |
2007.01.23 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
YOON JE-BUM;KOH CHA-WON;JUNG MYOUNG-HO;YEO GI-SUNG;KIM SANG-JIN |
分类号 |
G21G5/00 |
主分类号 |
G21G5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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