发明名称 ALUMINA FILM DEPOSITING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an alumina film depositing method capable of easily depositing an alumina film on a base material such as gold or the like, and controlling the thickness of the alumina film. SOLUTION: The alumina film depositing method comprises a first step of depositing a self-organization monomolecular layer 2 by orientating molecules having a carboxylic group on an end with respect to a surface of a base material 1 by the self-organization method, a second step of fixing boehmite particles 3 on the self-organization monomolecular layer 2, and a third step of depositing an alumina film 4 by heating and calcining the base material 1 on which the self-organization monomolecular layer 2 with the boehmite particles 3 fixed thereto is deposited. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007197737(A) 申请公布日期 2007.08.09
申请号 JP20060013875 申请日期 2006.01.23
申请人 UNIV KANAGAWA 发明人 KOIDE YOSHIHIRO
分类号 C23C18/12 主分类号 C23C18/12
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